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Full 3D Simulation of 6T-SRAM Cells for the 22nm Node
Changhwan Shin, Yasumasa Tsukamoto, Xin Sun, Tsu Jae King

Citation
Changhwan Shin, Yasumasa Tsukamoto, Xin Sun, Tsu Jae King. "Full 3D Simulation of 6T-SRAM Cells for the 22nm Node". SISPAD 2009, September, 2009.

Abstract
6T-SRAM cell designs for the 22nm node are compared via full 3-dimensional cell simulation with Sentaurus (v.2008.09), to allow the benefits of advanced MOSFET structures to be accurately assessed. Segmented MOSFET (SegFET) technology provides for enhanced read stability and write-ability, as compared to conventional planar and tri-gate technologies. It also provides for improved SRAM cell yield, primarily because of improved robustness to process-induced variations, and improved immunity to soft errors.

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Citation formats  

  • HTML
    Changhwan Shin, Yasumasa Tsukamoto, Xin Sun, Tsu Jae King.
    <a
    href="http://bwrc.eecs.berkeley.edu/php/pubs/pubs.php/1087.html">Full
    3D Simulation of 6T-SRAM Cells for the 22nm Node</a>,
    SISPAD 2009, September, 2009.
  • Plain text
    Changhwan Shin, Yasumasa Tsukamoto, Xin Sun, Tsu Jae King.
    "Full 3D Simulation of 6T-SRAM Cells for the 22nm Node".
    SISPAD 2009, September, 2009.
  • BibTeX
    @inproceedings{ShinTsukamotoSunKing2009,
        author = {Changhwan Shin and Yasumasa Tsukamoto and Xin Sun
                  and Tsu Jae King},
        title = {Full 3D Simulation of 6T-SRAM Cells for the 22nm
                  Node},
        booktitle = {SISPAD 2009},
        month = {September},
        year = {2009},
        URL = {http:///php/pubs/pubs.php/1087.html}
    }
    

Posted by Changhwan Shin on Jun 15, 2009..

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